Hybrid processing of Ti-6Al-4V using plasma immersion ion implantation combined with plasma nitriding
نویسندگان
چکیده
منابع مشابه
Gas nitriding and subsequent oxidation of Ti-6Al-4V alloys
Ti-6Al-4V alloys consisting of α-Ti grains and intergranular β-Ti islands were nitrided at 850°C for 1 to 12 h under a nitrogen pressure of 1 Pa. With increasing nitriding time, the Ti-N compound layer became thicker, and the α-Ti diffusion zone containing dissolved nitrogen became wider. In the Ti-N compound layer, the initially formed Ti2N became TiN as the nitriding progressed. The nitride l...
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Plasma immersion ion implantation (PIII) is an established technique in certain niche microelectronics applications such as the synthesis of silicon-oninsulator. In other applications such as shallow junction formation by plasma doping, trench doping, and fabrication of blue light emitting materials, PIII has unique advantages over conventional techniques and may be the technique of choice in t...
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A plasma treatment system (200) for implantation with a novel susceptor with a perforated shield (201). The system (200) has a variety of elements such as a chamber in which a plasma is generated in the chamber. The system (200) also has a susceptor disposed in the chamber to support a silicon substrate, which has a surface. The perforated shield (201) draws ions from the implantation toward an...
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Defects during Plasma Transfer Arc (PTA) beam fusion additive manufacturing (AM) processing of Ti-6Al-4V, including lack of fusion, porosity variations, and solidification cracking, have been monitored using near infrared (1.62 μm) imagery at 300 Hz, 300 μm spatial resolution and melt pool sizes of greater than 12μ. The temperature evolution exhibits a periodic temperature modulation of more th...
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ژورنال
عنوان ژورنال: Materials Research
سال: 2006
ISSN: 1516-1439
DOI: 10.1590/s1516-14392006000100018